| 摘要 |
An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which has a supply flow passage through which the liquid is supplied onto the substrate, and a liquid recovery mechanism which has a recovery flow passage through which the supplied liquid is recovered. At least one of the supply flow passage and the recovery flow passage is formed in a stacked member in which a plurality of plate members are stacked.
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