| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device that can conveniently detect the face position of a substrate with high accuracy even right after a dark condition is established that detection light is not injected into a photodetector. <P>SOLUTION: The exposure device includes: a face position detector for detecting the face position of the substrate depending on the position of injecting the detection light reflected from the surface of the substrate 4 into the photodetector 13; and a correction part 15c for correcting detected first face position information depending on a period for the dark condition that the detection light is not injected into the photodetector and for outputting second face position information. Otherwise, it includes a projection system and the photodetector for projecting the detection light to a detection region and for detecting the detection light reflected from the detection region, respectively, and the face position detector for detecting the face position of the detection region depending on the position of injecting the detection light into the photodetector. Herein, a control part 15 is provided for allowing: the projection of the detection light when a shot region of the substrate is located outside the detection region; and the injection of the detection light reflected from the detection region into the photodetector to set the photodetector into a predetermined condition. <P>COPYRIGHT: (C)2009,JPO&INPIT |
