发明名称 METHOD FOR FABRICATING MONOLITHIC TWO-DIMENSIONAL NANOSTRUCTURES
摘要 A patterning method for the creation of two-dimensional nanowire structures. Nanowire patterning methods are used with lithographical patterning approaches to form patterns in a layer of epoxy and resist material. These patterns are then transferred to an underlying thin film to produce a two-dimensional structure with desired characteristics.
申请公布号 WO2009011975(A3) 申请公布日期 2009.05.28
申请号 WO2008US64439 申请日期 2008.05.21
申请人 CALIFORNIA INSTITUTE OF TECHNOLOGY;HEATH, JAMES R.;WANG, DUNWEI;BUNIMOVICH, YURI;BOUKAI, AKRAM 发明人 HEATH, JAMES R.;WANG, DUNWEI;BUNIMOVICH, YURI;BOUKAI, AKRAM
分类号 H01L21/027 主分类号 H01L21/027
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