| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To precisely form an electrodeposition film having a desired film thickness over the surface of a substrate having a large surface area by a method for forming the electrodeposition film using light irradiation. <P>SOLUTION: In the method for forming the electrodeposition film on a substrate 101, comprising arranging an electrode 102 on any surface of a light source unit 103, then arranging the substrate 101 on which a semiconductor layer is formed in such a manner that the semiconductor layer opposes to the electrode 102 in an electrolytic solution 106 containing a metal ion, and irradiating the substrate 101 with light emitted from the light source unit 103 and having wavelength to form a photo-excited carrier, the electrode 102 has slits partially transmitting the light emitted from the light source unit 103. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
