发明名称 |
REFLECTIVE PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, PROJECTION METHOD, AND EXPOSURE METHOD |
摘要 |
A reflective projection optical system comprises a first optical unit having at least one reflecting optical element, and a second optical unit having at least one reflecting optical element. A focal point on the second surface side of the first optical unit approximately agrees with a focal point on the first surface side of the second optical unit. An angle between a normal to the first surface and a principal ray of the illumination beam incident to the first surface is larger than a value of arcsine of a numerical aperture on the first surface side of the reflective projection optical system. All the optical elements in the projection optical system are located outside an extension surface of a ray group defining an outer edge of the illumination beam incident to the first surface.
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申请公布号 |
US2009135510(A1) |
申请公布日期 |
2009.05.28 |
申请号 |
US20080323274 |
申请日期 |
2008.11.25 |
申请人 |
ONO TAKURO;CHIBA HIROSHI;KOMATSUDA HIDEKI |
发明人 |
ONO TAKURO;CHIBA HIROSHI;KOMATSUDA HIDEKI |
分类号 |
G02B17/06 |
主分类号 |
G02B17/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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