发明名称 CERAMIC FILM AND MANUFACTURING METHOD THEREOF, SEMICONDUCTOR DEVICE, PIEZOELECTRIC ELEMENT, AND ACTUATOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a ceramic film capable of improving the surface morphology of the ceramic film, to provide the obtained ceramic film, and to provide a semiconductor device and a piezoelectric element to which the ceramic film is applied. <P>SOLUTION: The manufacturing method of a ceramic film includes a step of forming the ceramic film 30 by crystallizing a raw material body 20. The raw material body 20 contains different types of raw materials in a mixed state, and the different types of raw materials differ from one another, in at least one of a crystal growth condition and a crystal growth mechanism in the crystallization of the raw materials. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009117851(A) 申请公布日期 2009.05.28
申请号 JP20080315884 申请日期 2008.12.11
申请人 SEIKO EPSON CORP 发明人 NATORI EIJI;FURUYAMA KOICHI;TAZAKI YUZO
分类号 H01L21/316;C01G1/00;C01G25/00;C01G29/00;C04B35/00;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;H01L41/187;H01L41/317;H01L41/39;H01L41/43 主分类号 H01L21/316
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