发明名称 |
CERAMIC FILM AND MANUFACTURING METHOD THEREOF, SEMICONDUCTOR DEVICE, PIEZOELECTRIC ELEMENT, AND ACTUATOR |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a ceramic film capable of improving the surface morphology of the ceramic film, to provide the obtained ceramic film, and to provide a semiconductor device and a piezoelectric element to which the ceramic film is applied. <P>SOLUTION: The manufacturing method of a ceramic film includes a step of forming the ceramic film 30 by crystallizing a raw material body 20. The raw material body 20 contains different types of raw materials in a mixed state, and the different types of raw materials differ from one another, in at least one of a crystal growth condition and a crystal growth mechanism in the crystallization of the raw materials. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009117851(A) |
申请公布日期 |
2009.05.28 |
申请号 |
JP20080315884 |
申请日期 |
2008.12.11 |
申请人 |
SEIKO EPSON CORP |
发明人 |
NATORI EIJI;FURUYAMA KOICHI;TAZAKI YUZO |
分类号 |
H01L21/316;C01G1/00;C01G25/00;C01G29/00;C04B35/00;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;H01L41/187;H01L41/317;H01L41/39;H01L41/43 |
主分类号 |
H01L21/316 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|