| 摘要 |
PROBLEM TO BE SOLVED: To provide a tantalum sputtering target having a high deposition speed and excellent uniformity of film, producing less arcings and particles and having excellent film forming properties, and to provide the method capable of stably manufacturing the target by improving and devising plastic working steps such as forging and rolling, and the heat treatment step. SOLUTION: In the tantalum sputtering target manufactured by performing plastic-working of a molten and cast tantalum ingot or billet through forging, annealing and rolling, the structure of the tantalum target comprises a non-recrystallized structure. COPYRIGHT: (C)2009,JPO&INPIT
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