MEMS SCANNING MICROMIRROR MANUFACTURING METHOD

摘要

A MEMS scanning micromirror manufacturing method with a method for manufacturing a MEMS scanning micromirror having a cantilever beam including providing a silicon on insulator (SOI) wafer 200 having a first silicon layer 202, a second silicon layer 206, and an insulating layer 204 between the first silicon layer 202 and the second silicon layer 206, the thickness of the first silicon layer 202 being a final thickness of the cantilever beam 72; and fashioning the cantilever beam 72 from the first silicon layer 202 while maintaining the final thickness of the cantilever beam.