发明名称 DISK SUBSTRATE ETCHING METHOD, DISK SUBSTRATE ETCHING DEVICE, AND MAGNETIC DISK MEDIA MANUFACTURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a disk substrate etching method, disk substrate etching device, or magnetic disk media manufacturing apparatus which continuously etch a plurality of disks simultaneously roe each side of a magnetic film of a disk substrate by circulating a palette which contains a plurality of disk substrates. SOLUTION: A plurality of bosses are prepared in a first palette and a plurality of disk substrates are contained on a first palette by inserting each boss in a central opening respectively, and one side of each of a plurality of disk substrates in the first palette loaded onto the etching device are simultaneously etched. A plurality of disk substrate are reversed and transferred to a second palette by covering the first palette with the second palette of the same type after etching and turning it over, and the palette is circulated in the device. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009116926(A) 申请公布日期 2009.05.28
申请号 JP20070285797 申请日期 2007.11.02
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MORI KYOICHI;YAMAZAKI FUJIO
分类号 G11B5/84 主分类号 G11B5/84
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