发明名称 SUBSTRATE PROCESSING APPARATUS AND COATING APPARATUS AND COATING METHOD
摘要 PROBLEM TO BE SOLVED: To stably float and convey a rectangular substrate to be processed on a flotation stage while holding the substrate in a fixed posture suitable for processing with simple constitution. SOLUTION: First and second holding portions 106L and 106R of first (left-side) and second (right-side) conveyance portions 84L and 84R have two suction pads 108L and 108R coupled to rear surfaces (lower surfaces) of two left-side corners of the substrate and rear surfaces (lower surfaces) of two right-side corners with vacuum sucking force, a pair of pad support portions 110R etc., supporting the suction pads 108L and 108R at two places leaving a certain gap in a conveying direction (X direction) while restricting vertical displacement, and a pair of pad actuators 112R etc., elevating and moving or displacing the pair of pad support portions 110R etc., independently. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009117571(A) 申请公布日期 2009.05.28
申请号 JP20070288238 申请日期 2007.11.06
申请人 TOKYO ELECTRON LTD 发明人 SHINOZAKI MASAYA;OTSUKA YOSHITAKA;NAKAMITSU TAKASHI;IKEMOTO DAISUKE;MINE YOSUKE
分类号 H01L21/027;B05C13/02;B65G49/06;B65G49/07;B65G51/03;H01L21/677;H01L21/683 主分类号 H01L21/027
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