| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method by which a relatively large area can be exposed, and to provide an exposure apparatus that can be made compact and can expose a relatively large area. <P>SOLUTION: The exposure method comprises: making a beam from a light source scan an exposure object via an optical element LG; and exposing a pattern PA1 whose region is enlarged on the exposure object in a direction approximately perpendicular to the scanning direction X, via the optical element on the exposure object. <P>COPYRIGHT: (C)2009,JPO&INPIT |
