SUBSTRATE OSCILLATING APPARATUS FOR RAPID THERMAL PROCESS,申请号KR20070119829-传众专利搜索

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发明名称	SUBSTRATE OSCILLATING APPARATUS FOR RAPID THERMAL PROCESS
摘要
申请公布号	KR20090053150(A)	申请公布日期	2009.05.27
申请号	KR20070119829	申请日期	2007.11.22
申请人	ASIA PACIFIC SYSTEMS INC.	发明人	SHIM, JANG WOO;KIM, SEUNG YONG;LEE, SANG SEOK;JEON, HYO YOUNG
分类号	H01L21/324;H01L21/02	主分类号	H01L21/324
代理机构		代理人
主权项
地址

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