发明名称 |
Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel |
摘要 |
There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (b) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.
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申请公布号 |
US7537810(B2) |
申请公布日期 |
2009.05.26 |
申请号 |
US20050550577 |
申请日期 |
2005.09.22 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
HAYASHI SHINJI;SEGA SHUNSUKE;TAGUCHI HIROMU;HASEGAWA MITSUTAKA |
分类号 |
C09K19/00;C09K19/38;G02B5/22;G02F1/13;G02F1/1333;G02F1/1335;G03C1/00;G03F7/00;G03F7/027;G03F7/033;G03F7/038 |
主分类号 |
C09K19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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