发明名称 Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel
摘要 There are provided: a curable resin composition having a high exposure sensitivity and a good developing property, and thereby capable of forming an accurate and precise pattern; a liquid crystal panel substrate on which a protective film for covering a color layer or spacers for a liquid crystal layer, by using the curable resin composition, hardly causing a color irregularity and contrast irregularity; and a liquid crystal panel using the liquid crystal panel substrate and having a superior display quality. The curable resin composition of the present invention comprises: a copolymer (a) having a molecular structure in which a constitutional unit including an acidic functional unit and a constitutional unit including a photocurable functional group are linked at least; a photopolymerization initiator (b) having a tertiary amine structure; and a photocurable compound (c) having at least one acidic functional group and at least three photocurable functional groups.
申请公布号 US7537810(B2) 申请公布日期 2009.05.26
申请号 US20050550577 申请日期 2005.09.22
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 HAYASHI SHINJI;SEGA SHUNSUKE;TAGUCHI HIROMU;HASEGAWA MITSUTAKA
分类号 C09K19/00;C09K19/38;G02B5/22;G02F1/13;G02F1/1333;G02F1/1335;G03C1/00;G03F7/00;G03F7/027;G03F7/033;G03F7/038 主分类号 C09K19/00
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