发明名称 Method for manufacturing a droplet ejection head
摘要 A method for manufacturing a droplet ejection head includes a step of forming recessed sections for forming nozzles by etching half way through a first face of a silicon substrate, a step of bonding a first support substrate to the first face of the silicon substrate, a step of reducing the thickness of the silicon substrate by processing a second face of the silicon substrate that is opposite to the first face thereof, and making the recessed sections through holes, and a step of removing the first support substrate from the silicon substrate after the reduction of the thickness of the silicon substrate.
申请公布号 US7536785(B2) 申请公布日期 2009.05.26
申请号 US20050295758 申请日期 2005.12.07
申请人 SEIKO EPSON CORPORATION 发明人 ARAKAWA KATSUJI;MATSUMOTO YASUTAKA
分类号 B21D53/00 主分类号 B21D53/00
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