发明名称 |
ELECTRODE SUBSTRATE FOR PHOTOELECTRIC CONVERSION DEVICE, METHOD FOR MANUFACTURING ELECTRODE SUBSTRATE FOR PHOTOELECTRIC CONVERSION DEVICE, AND PHOTOELECTRIC CONVERSION DEVICE |
摘要 |
<p>A method for manufacturing an electrode substrate for photoelectric conversion devices comprises a step for forming a transparent conductive film and a current collection wiring, a step for forming a porous oxide semiconductor layer in a position where the current collection wiring is not formed, a step for burning the porous oxide semiconductor layer, a step for forming a protective layer composed of an insulating resin and having a heat resistance of 250°C or above so as to cover the current collection wiring, which step follows the burning step, and a step for making the porous oxide semiconductor layer adsorb a pigment, which follows the formation of the protective layer. The manufacturing method is further provided with a step for heating the substrate at 250°C or above during or after the formation of the protective layer and before the step for making the porous oxide semiconductor layer adsorb a pigment.</p> |
申请公布号 |
WO2009063973(A1) |
申请公布日期 |
2009.05.22 |
申请号 |
WO2008JP70757 |
申请日期 |
2008.11.14 |
申请人 |
FUJIKURA LTD.;MATSUI, HIROSHI;OKADA, KENICHI |
发明人 |
MATSUI, HIROSHI;OKADA, KENICHI |
分类号 |
H01M14/00;H01L31/04;H01M2/22 |
主分类号 |
H01M14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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