发明名称 ELECTRODE SUBSTRATE FOR PHOTOELECTRIC CONVERSION DEVICE, METHOD FOR MANUFACTURING ELECTRODE SUBSTRATE FOR PHOTOELECTRIC CONVERSION DEVICE, AND PHOTOELECTRIC CONVERSION DEVICE
摘要 <p>A method for manufacturing an electrode substrate for photoelectric conversion devices comprises a step for forming a transparent conductive film and a current collection wiring, a step for forming a porous oxide semiconductor layer in a position where the current collection wiring is not formed, a step for burning the porous oxide semiconductor layer, a step for forming a protective layer composed of an insulating resin and having a heat resistance of 250°C or above so as to cover the current collection wiring, which step follows the burning step, and a step for making the porous oxide semiconductor layer adsorb a pigment, which follows the formation of the protective layer. The manufacturing method is further provided with a step for heating the substrate at 250°C or above during or after the formation of the protective layer and before the step for making the porous oxide semiconductor layer adsorb a pigment.</p>
申请公布号 WO2009063973(A1) 申请公布日期 2009.05.22
申请号 WO2008JP70757 申请日期 2008.11.14
申请人 FUJIKURA LTD.;MATSUI, HIROSHI;OKADA, KENICHI 发明人 MATSUI, HIROSHI;OKADA, KENICHI
分类号 H01M14/00;H01L31/04;H01M2/22 主分类号 H01M14/00
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