| 发明名称 |
CERAMIC FILM AND METHOD OF MANUFACTURING THE SAME, SEMICONDUCTOR DEVICE, PIEZOELECTRIC DEVICE, AND ACTUATOR |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a ceramic film by which a surface morphology of the ceramic film can be improved, and to provide the ceramic film obtained by the method of manufacturing the ceramic film and a semiconductor device and piezoelectric device to each of which the ceramic film is applied. <P>SOLUTION: The method of manufacturing the ceramic film includes a step of forming the ceramic film 30 by crystallizing a raw material body 20. The raw material body 20 contains different types of raw materials in a mixed state. The different types of raw materials differ from one another in at least one of a crystal growth condition and a crystal growth mechanism in the crystallization of the raw materials. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
| 申请公布号 |
JP2009107923(A) |
申请公布日期 |
2009.05.21 |
| 申请号 |
JP20080315883 |
申请日期 |
2008.12.11 |
| 申请人 |
SEIKO EPSON CORP |
发明人 |
NATORI EIJI;FURUYAMA KOICHI;TAZAKI YUZO |
| 分类号 |
C01G29/00;C01G1/00;C01G21/00;C01G25/00;C01G35/00;C01G41/00;C04B35/00;H01L21/316;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;H01L41/187;H01L41/317;H01L41/39;H01L41/43 |
主分类号 |
C01G29/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
