| 摘要 |
PROBLEM TO BE SOLVED: To efficiently and effectively treat the periphery portion of a substrate having surface roughness or defect, or an unnecessary adhered material etc. becoming a pollution source which has occurred. SOLUTION: The treatment method of the periphery portion of the substrate for carrying out the treatment of the substrate surface in the periphery portion of the substrate includes the surface state monitoring step for monitoring the surface state in the periphery portion of the substrate, the treatment condition determining step for determining the substrate surface treatment condition for executing the treatment of the substrate surface and including the existence of the necessity of the treatment of the substrate based on the monitoring result of the surface state, and the substrate surface treatment step for executing the treatment of the substrate surface for the periphery portion of the substrate when there is the necessity for the treatment of the substrate surface. COPYRIGHT: (C)2009,JPO&INPIT
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