发明名称 Methods for Sample Preparation and Observation, Charged Particle Apparatus
摘要 In an SEM observation in a depth direction of a cross section processed by repeated FIB cross-sectioning and SEM observation to correct a deviation in an observation field of view and a deviation in focus, are corrected, the deviations occurring when a processed cross section moves in the depth direction thereof; information on a height and a tilt of a surface of cross section processing area is calculated before the processing, the above information is used, the deviation in a field of view and the deviation in focus in SEM observation, which correspond to an amount of movement of the cross section at a time of the processing, are predicted, and the SEM is controlled based on the predicted values.
申请公布号 US2009127458(A1) 申请公布日期 2009.05.21
申请号 US20090353303 申请日期 2009.01.14
申请人 HITACHI HIGH-TECHNOLOGIES 发明人 ISHITANI TOHRU;KABASAWA UKI;OHNISHI TSUYOSHI
分类号 G01N23/00 主分类号 G01N23/00
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