发明名称 |
Illumination optics apparatus, exposure method, exposure apparatus, and method of manufacturing electronic device |
摘要 |
An illumination optical apparatus which constantly controls a plurality of polarization states with high accuracy. An illumination optical system, which illuminates a pattern surface of a mask with illumination light, includes a polarization optical system and a depolarizer. The polarization optical system includes a half wavelength plate and PBS, which varies a polarization state of the illumination light to form a linear polarization state having a predetermined polarization direction. The depolarizer is arranged toward the mask from the polarization optical system and varies the polarization state of the illumination light emitted from the polarization optical system.
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申请公布号 |
US2009128796(A1) |
申请公布日期 |
2009.05.21 |
申请号 |
US20080287497 |
申请日期 |
2008.10.08 |
申请人 |
NIKON CORPORATION |
发明人 |
TANAKA HIROHISA |
分类号 |
G03F7/20;F21V9/14;G03F7/26 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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