| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for treating a substrate capable of keeping the inside of an exposure apparatus clean and reducing a pressure change, a method for conveying the substrate, and an apparatus for conveying the substrate. SOLUTION: The method for treating the substrate before exposing the substrate to which a resist is applied includes a process of baking the substrate to which the resist is applied, and a process of holding the baked substrate in an atmosphere which substantially includes no moisture until conveying the substrate to the exposure apparatus. COPYRIGHT: (C)2009,JPO&INPIT
|
