发明名称 |
pH buffered aqueous cleaning composition and method for removing photoresist residue |
摘要 |
A residue cleaning composition includes: (a) water; (b) a fluoride; (c) a pH buffer system including an organic acid and a base. The organic acid can be an aminoalkylsulfonic acid and/or an aminoalkylcarboxylic acid. The base can be an amine and/or a quaternary alkylammonium hydroxide. The composition is substantially free of an added organic solvent and has a pH ranging from about 5 to about 12. A method of removing residue from a substrate includes contacting the residue with the cleaning composition. A method for defining a pattern includes etching the pattern through a photoresist into a substrate, heating the patterned substrate to a temperature sufficient to ash the photoresist and provide a residue, and removing the residue by contacting the residue with the cleaning composition.
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申请公布号 |
US7534753(B2) |
申请公布日期 |
2009.05.19 |
申请号 |
US20060330815 |
申请日期 |
2006.01.12 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
WU AIPING;ROVITO ROBERTO JOHN |
分类号 |
C11D7/32 |
主分类号 |
C11D7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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