发明名称 Vertically integrated dual gate transistor structure and method of making same
摘要 A dual gate power switch comprised of a vertical arrangement of a normally off SIT (static induction transistor) in series with a normally on SIT in a monolithic semiconductor structure. The structure includes a first pillar having at the base thereof laterally extending shoulder portions having sections of a first gate for controlling the normally off SIT. The structure includes a second pillar, of a width greater than the first pillar and which also has laterally extending shoulder portions having sections of a second gate for controlling the normally on SIT. Contacts are provided for SIT operation.
申请公布号 US7535039(B1) 申请公布日期 2009.05.19
申请号 US20060453819 申请日期 2006.06.16
申请人 NORTHROP GRUMMAN CORP 发明人 STEWART ERIC J.;VAN CAMPEN STEPHEN;CLARKE ROWLAND C.
分类号 H01L29/80 主分类号 H01L29/80
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