发明名称 NITRIDE SEMICONDUCTOR WAFER, AND METHOD FOR MANUFACTURING OF NITRIDE SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a nitride semiconductor element formed by being divided so as to be flat in a resonator end face. SOLUTION: When an LD structure 251 is constituted on a GaN-based substrate 250, cleavage introduction grooves 252 are formed by being scribed by a diamond-edge blade from the surface of the LD structure 251. The cleavage introduction grooves 252 are formed between stripe-shaped optical waveguides 253 which are formed in parallel to the direction of [1-100]-orientation of a wafer, and the grooves 252 are formed in shapes of dashed lines in the direction of [11-20]-orientation of the wafer. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009105466(A) 申请公布日期 2009.05.14
申请号 JP20090032217 申请日期 2009.02.16
申请人 SHARP CORP 发明人 KAWAKAMI TOSHIYUKI;YAMAZAKI YUKIO;ITO SHIGETOSHI;OMI SUSUMU
分类号 H01S5/343 主分类号 H01S5/343
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