发明名称 |
Mask for use in coordinate measuring machine, has mark for determining rotary position of mask and exhibiting rotary and non-rotary structural elements that represent non-rotary symmetrical figure |
摘要 |
The mask (22) has a mark (30) for determining a rotary position of the mask. The mark is formed in a non-rotary symmetrical manner and exhibiting a rotary symmetrical structural element and a non-rotary structural element, where the two structural elements represent a non-rotary symmetrical figure (32). The rotary symmetrical structural element is formed as a cross with four axes in 90 degree angle. The non-rotary symmetrical structural element is arranged eccentrically with respect to a centre point of the cross. An independent claim is also included for a method for determining a rotary position of a disc-shaped substrate. |
申请公布号 |
DE102007000973(A1) |
申请公布日期 |
2009.05.14 |
申请号 |
DE20071000973 |
申请日期 |
2007.11.05 |
申请人 |
VISTEC SEMICONDUCTOR SYSTEMS GMBH |
发明人 |
LASKE, FRANK;SCHMIDT, KARL-HEINRICH |
分类号 |
G03F9/00;G01B11/00;G01B11/03;G01B11/26 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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