发明名称 Mask for use in coordinate measuring machine, has mark for determining rotary position of mask and exhibiting rotary and non-rotary structural elements that represent non-rotary symmetrical figure
摘要 The mask (22) has a mark (30) for determining a rotary position of the mask. The mark is formed in a non-rotary symmetrical manner and exhibiting a rotary symmetrical structural element and a non-rotary structural element, where the two structural elements represent a non-rotary symmetrical figure (32). The rotary symmetrical structural element is formed as a cross with four axes in 90 degree angle. The non-rotary symmetrical structural element is arranged eccentrically with respect to a centre point of the cross. An independent claim is also included for a method for determining a rotary position of a disc-shaped substrate.
申请公布号 DE102007000973(A1) 申请公布日期 2009.05.14
申请号 DE20071000973 申请日期 2007.11.05
申请人 VISTEC SEMICONDUCTOR SYSTEMS GMBH 发明人 LASKE, FRANK;SCHMIDT, KARL-HEINRICH
分类号 G03F9/00;G01B11/00;G01B11/03;G01B11/26 主分类号 G03F9/00
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