发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of saving space and reducing costs. SOLUTION: The substrate processing apparatus includes a plurality of substrate processing chambers 230, 240, 250, and a common transfer chamber 220 for transferring a substrate W to each substrate processing chamber. In the substrate processing apparatus, prescribed processing is performed to the substrate W while transferring the substrate W in an upright posture. At least one of the substrate processing chambers 230, 240, 250 is arranged above or below the common transfer chamber 220, and a substrate passing port through which the substrate W can pass is arranged at a boundary section between the processing chamber and the transfer chamber 220. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009105081(A) 申请公布日期 2009.05.14
申请号 JP20070272694 申请日期 2007.10.19
申请人 EBATEKKU:KK 发明人 INO EIJI;WATANABE AKIRA;ASHIDA HAJIME
分类号 H01L21/677;C23C14/56;C23C16/44;H01L21/205;H01L21/3065 主分类号 H01L21/677
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