| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion beam processing technology which improves processing accuracy for forming a cross section of a sample by an ion beam without making a processing time longer than before, and reduces time for separation of a fine sample or preparation time for that without dividing the sample into small pieces. SOLUTION: In the ion beam processing device, an axis pulling an ion beam from an ion source 1, and an ion beam irradiation axis irradiating the ion beam onto a sample 11 mounted on a first sample stage 13 are in a slant relation, and further, a second sample stage 24 with a sample piece 303 extracted and mounted by an ion beam process from the sample has a titing function capable of changing an irradiation angle of the ion beam to the sample by rotating around a slant axis. A segment projecting an axis pulling the ion beam from the ion source on a face perpendicular to the ion beam irradiation axis can be at least nearly parallel to a segment projecting a slant axis of the second sample stage on a face perpendicular to the ion beam irradiation axis. COPYRIGHT: (C)2009,JPO&INPIT
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