EPOXY GROUP-CONTAINING ORGANOSILOXANE COMPOUND, CURABLE COMPOSITION FOR TRANSFER MATERIAL, AND FINE PATTERN FORMING METHOD USING THE COMPOSITION

摘要

Disclosed is a curable composition for transfer materials, which is applicable to a UV nanoimprint process which enables formation of a fine pattern with high throughput, and is sometimes applicable even to a thermal nanoimprint process. This curable composition for transfer materials enables formation of a fine pattern having high selectivity between etching rates of a fluorine gas and an oxygen gas. Specifically disclosed is a curable composition for transfer materials characterized by containing a curable silicon compound which is produced by a hydrosilylation reaction between a silicon compound (A) having an Si-H group and a compound (B) having a curable functional group and a carbon-carbon double bond other than the curable functional group.