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发明名称
POLISHING PAD AND CHEMICAL MECHANICAL POLISHING DEVICE HAVING IT
摘要
申请公布号
KR20090047021(A)
申请公布日期
2009.05.12
申请号
KR20070112980
申请日期
2007.11.07
申请人
DONGBU HITEK CO., LTD.
发明人
CHO, KWENG RAE
分类号
B24B37/20;B24B37/04;B24D11/00;H01L21/304
主分类号
B24B37/20
代理机构
代理人
主权项
地址
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