发明名称 Semiconductor integrated circuit device and substrate bias controlling method
摘要 A semiconductor integrated circuit device includes: a first bias generating circuit, a second bias generating circuit and a control circuit. The first bias generating circuit generates a first substrate bias voltage of a P-channel transistor. The second bias generating circuit generates a second substrate bias voltage of N-channel transistor. The control circuit controls the first bias generating circuit and the second bias generating circuit independently on the basis of operating states of circuits to which the first substrate bias voltage and the second substrate bias voltage are applied.
申请公布号 US7532059(B2) 申请公布日期 2009.05.12
申请号 US20070783432 申请日期 2007.04.09
申请人 NEC ELECTRONICS CORPORATION 发明人 NARITAKE ISAO
分类号 G05F1/10 主分类号 G05F1/10
代理机构 代理人
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