| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing machine for a color filter substrate, capable of uniformly polishing the whole surface of a substrate, even if the size of the substrate becomes large area, or even if the substrate has either longitudinal or lateral stripe patterns. SOLUTION: This polishing machine is provided with at least a surface plate 10 for mounting and fixing the color filter 1 on a horizontal and long frame 30, a conveying mechanism 39 for making the surface plate 10 movable between a projecting side and a carrying-out side, and a polishing part 29 arranged with a pair of rolled polishing tools 20 at a horizontal direction inclination angle of 30°or more and less than 90°, with respect to the substrate moving direction and at a mutually line-symmetric angle. The polishing machine polishes the surface of the color filter 1 by passing the surface plate 10 through the polishing part 29, in a state of a polishing tool having the lower surface rotated in a direction opposite to the moving direction of the surface plate 10 at 50 to 600 rpm. COPYRIGHT: (C)2009,JPO&INPIT |
