发明名称 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, OPTICAL ELEMENT AND MANUFACTURING METHOD THEREOF, AND DEVICE MANUFACTURING METHOD
摘要 An illumination optical system which illuminates a surface to be illuminated on the basis of light from a light source (1) has a first optical path in which a diffractive optical element (6) can be arranged at a first position thereof; a second optical path in which a spatial light modulator (3) with a plurality of optical elements (3a) arrayed two-dimensionally and controlled individually can be arranged at a second position thereof; and a third optical path which is an optical path of light having passed via at least one of the first optical path and the second optical path and in which a distribution forming optical system (11) is arranged. The distribution forming optical system (11) forms a predetermined light intensity distribution on an illumination pupil located in the third optical path, based on the light having passed via at least one of the first and second optical paths.
申请公布号 WO2009035129(A3) 申请公布日期 2009.05.07
申请号 WO2008JP66803 申请日期 2008.09.10
申请人 NIKON CORPORATION;TANITSU, OSAMU 发明人 TANITSU, OSAMU
分类号 G02B26/08;G02B27/00;G02B27/09;G03F7/20 主分类号 G02B26/08
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