| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for producing an imprint mold having a highly precise fine pattern formed thereon by using a mask blank. <P>SOLUTION: A mask blank has a thin film for the formation of a pattern formed on a light-permeable substrate. The thin film comprises an upper layer comprising a material containing Cr and nitrogen and a lower layer containing a compound mainly composed of Ta and comprising a material that can be etched by a dry etching process with a chlorine-containing gas. The upper layer and the lower layer of the thin film are etched by a dry etching process with a chlorine-containing gas that substantially contains no oxygen, and the substrate is etched by a dry etching process with a fluorine-containing gas, thereby producing an imprint mold. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
