| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and method for inspecting unevenness of a periodic pattern which can accurately image and detect unevenness even in an object to be inspected in which it is difficult to inspect by visible light, such as a periodic pattern, particularly a halftone mask. SOLUTION: The apparatus comprises: a transmission lighting part 10; a reflection lighting part 20; an XY stage part 30 allowing transmission lighting and reflection lighting; a light source part 40; an imaging part 50 for picking up an image of a substrate 70 to be inspected; and a processing part 60 having functions to perform image input of the output from the imaging part 50 as digitalized image information, to perform computation such as image enhancement processing, and to display the image. COPYRIGHT: (C)2009,JPO&INPIT
|
