PLASMA PROCESS APPARATUS USED FOR MANUFACTURING SEMICONDUCTOR DEVICE,申请号KR20070110513-传众专利搜索

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发明名称	PLASMA PROCESS APPARATUS USED FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要
申请公布号	KR20090044420(A)	申请公布日期	2009.05.07
申请号	KR20070110513	申请日期	2007.10.31
申请人	HYNIX SEMICONDUCTOR INC.	发明人	CHOI, YONG KYOO
分类号	H01L21/3065	主分类号	H01L21/3065
代理机构		代理人
主权项
地址

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