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发明名称
Method of deposition of silicon carbide film in integrated circuit fabrication
摘要
申请公布号
EP1176226(B1)
申请公布日期
2009.05.06
申请号
EP20010116054
申请日期
2001.07.02
申请人
APPLIED MATERIALS, INC.
发明人
NEMANI, SRINIVAS D.;XIA, LI-QUN;SUGIARTO, DIAN;YIEH, ELLIE;XU, PING;CAMPANA-SCHMITT, FRANCIMAR;LEE, JIA
分类号
C23C16/32;C23C16/42;H01L21/20;H01L21/314;H01L21/768;H01L23/522
主分类号
C23C16/32
代理机构
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