CHARGED PARTICLE BEAM MICROSCOPE AND MEASURING METHOD USING SAME

摘要

A charged particle beam device is equipped with a function of: obtaining an approximation function of a sample drift from a visual field shift amount among plural images (S1); capturing a save image while correcting the drift on the basis of the approximation function (S2); and creating from the save image a target image in which the effect of the sample drift is reduced (S3). This makes it possible to smooth the random errors in the visual field shift measurements by approximating the sample drift to the function and also to predict the sample drift changing over time. Therefore, it is possible to provide a charged particle beam device in which the effect of the sample drift is very limited even in a high magnification and also provide a measuring method using the charged particle beam device.