发明名称 |
Method and apparatus for removing a liquid from a surface of a substrate |
摘要 |
A method and apparatus for removing a first liquid from a surface of a substrate is provided. A second liquid is supplied to at least part of a surface of a substrate having a rotary movement. The rotary movement has a center of rotation and an edge of rotation. The second liquid is directed from the center of rotation to the edge of rotation using a nozzle. A dry zone is created on the substrate as the position of the spray moves from the center of rotation to the edge of rotation. As a result, the first liquid and the second liquid are removed from the surface of the substrate.
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申请公布号 |
US7527698(B2) |
申请公布日期 |
2009.05.05 |
申请号 |
US20030430489 |
申请日期 |
2003.05.06 |
申请人 |
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM (IMEC,VZW) |
发明人 |
HOLSTEYNS FRANK;HEYNS MARC;MERTENS PAUL W. |
分类号 |
B08B3/04;H01L21/00;H01L21/306 |
主分类号 |
B08B3/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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