发明名称 Method and apparatus for removing a liquid from a surface of a substrate
摘要 A method and apparatus for removing a first liquid from a surface of a substrate is provided. A second liquid is supplied to at least part of a surface of a substrate having a rotary movement. The rotary movement has a center of rotation and an edge of rotation. The second liquid is directed from the center of rotation to the edge of rotation using a nozzle. A dry zone is created on the substrate as the position of the spray moves from the center of rotation to the edge of rotation. As a result, the first liquid and the second liquid are removed from the surface of the substrate.
申请公布号 US7527698(B2) 申请公布日期 2009.05.05
申请号 US20030430489 申请日期 2003.05.06
申请人 INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM (IMEC,VZW) 发明人 HOLSTEYNS FRANK;HEYNS MARC;MERTENS PAUL W.
分类号 B08B3/04;H01L21/00;H01L21/306 主分类号 B08B3/04
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