发明名称 Punch-through diode and method of processing the same
摘要 A monolithically integrated punch-through diode with a Schottky-like behavior. This is achieved as a Schottky-metal area (16) is deposited onto at least part of the first p-doped well's (9) surface. The Schottky-metal area (16) and the p-doped well (9) form the metal-semiconductor-transition of a Schottky-diode. The overvoltage protection of the inventive PT-diode is improved as the forward characteristic has a voltage drop that is less than 0.5V.
申请公布号 US7528459(B2) 申请公布日期 2009.05.05
申请号 US20050561895 申请日期 2005.12.21
申请人 NXP B.V. 发明人 RITTER HANS-MARTIN;LUEBBE MARTIN;WYNANTS JOCHEN
分类号 H01L27/095;H01L27/07;H01L27/08;H01L29/861;H01L29/872 主分类号 H01L27/095
代理机构 代理人
主权项
地址