| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask blank inspection device and method capable of inspecting accurately and simply existence and the kind of a defect of a reflective mask blank. <P>SOLUTION: The mask blank inspection device is constituted of a stage 2 for mounting a reflective mask blank M thereon, a light source 1 for generating inspection light BM, a mirror 10 serving as an illuminating optical system, a dark field imaging optical system L, a beam splitter BS, two two-dimensional array sensors Sa, Sb, signal storage units 6, 7, an image processing unit 8, and a main control unit 9 for controlling operation of the whole device, or the like. The sensor Sa is arranged on a position displaced by a predetermined distance d1 along a light traveling direction from an imaging plane IPa of a light flux 14a. The sensor Sb is arranged on a position displaced by a predetermined distance d2 in the opposite direction to the light traveling direction from an imaging plane IPb of a light flux 14b. <P>COPYRIGHT: (C)2009,JPO&INPIT |
