SUBSTRATE HOLDING UNIT, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a substrate holding unit which holds the substrate so that a process is uniformly carried out for the whole of substrate of a semiconductor etc. and a substrate processing apparatus and substrate processing method using the same which are excellent in efficiency. SOLUTION: The substrate holding unit includes a first holding portion and a second holding portion. The first holding portion can move in the first direction and holds a first portion of the substrate for the substrate whose working fluid is provided in the direction corresponding to the first direction. The second portion can moves in the second direction and holds the second portion of the substrate. At least one of the first and second holding portions holds the substrate while the working fluid is provided. COPYRIGHT: (C)2009,JPO&INPIT