| 摘要 |
<p>A misregistration mark and a method measuring arrangement using the same are provided to prevent deformation of a shape due to a process by using a circular shape outline in a measurement image of a misregistration mark. A misregistration mark includes a mother scale(120) of a circular shape and a son scale(130) of a circular shape, and is positioned on a semiconductor substrate(110). The son scale is arranged on the mother scale. The mother scale is formed on a preceding layer by exposure and etching with a pattern having an opening part having a first outline. The son scale is formed on a following layer. The opening part of the mother scale is arranged inside the first outline. The son scale is formed into a photoresist pattern of a relatively small size.</p> |
