| 摘要 |
THE PRESENT INVENTION PROVIDES FOR A LIGHT-SENSITIVE PHOTORESIST COMPOSITION USEFUL FOR IMAGING THICK FILMS, COMPRISING A POLYMER WHICH IS INSOLUBLE IN AN AQUEOUS ALKALI DEVELOPER BUT BECOMES SOLUBLE PRIOR TO DEVELOPMENT, A PHOTOACID GENERATOR WHICH PRODUCES A STRONG ACID UPON IRRADIATION AND A PHOTOBLEACHABLE DYE. THE INVENTION FURTHER PROVIDES FOR A PROCESS FOR IMAGING THE PHOTORESIST OF THE PRESENT INVENTION, ESPECIALLY WHERE THE THICKNESS OF THE PHOTORESIST IS UP TO 200 MICRONS AND WHERE THE PROCESS COMPRISES A SINGLE EXPOSURE STEP.
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