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发明名称
Lithographic apparatus and device manufacturing method
摘要
申请公布号
EP1628162(B1)
申请公布日期
2009.04.29
申请号
EP20050254919
申请日期
2005.08.05
申请人
ASML NETHERLANDS B.V.
发明人
BASELMANS, JOHANNES JACOBUS MATHEUS;BLEEKER, ARNO JAN;DE JAGER, PIETER WILLEM HERMAN;TROOST, KARS ZEGER
分类号
G03F7/20;G02B5/18;G02B26/08
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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