| 发明名称 |
Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufacturing thereby |
| 摘要 |
A multi-layered spectral purity filters improves the spectral purity of an Extreme UltraViolet (EUV) radiation beam and also collect debris emitted from a radiation source.
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| 申请公布号 |
EP2053464(A1) |
申请公布日期 |
2009.04.29 |
| 申请号 |
EP20080020593 |
申请日期 |
2006.03.22 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
BANINE, VADIM YEVGENYEVICH;MOORS, JOHANNES HUBERTUS;SJMAENOK, LEONID AIZIKOVITCH;SALASHCHENKO, NIKOLAY NIKOLAEVITCH |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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