发明名称 |
Multiple pattern generator integration with single post expose bake station |
摘要 |
A system and method of operation for a lithographic system having multiple exposure stations sharing one or more post-expose bake station and a centralized control system that schedules work through the expose station to the post-expose bake station while taking into consideration the patterning time for work pieces to be scheduled as well as the amount of post-expose delay allowable for the exposed work pieces.
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申请公布号 |
US7525646(B1) |
申请公布日期 |
2009.04.28 |
申请号 |
US20080057345 |
申请日期 |
2008.03.27 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
SULLIVAN DANIEL BOYD;CALDWELL BRAIN NEAL;SMITH ADAM CHARLES;RANKIN JED HICKORY |
分类号 |
G03B27/32 |
主分类号 |
G03B27/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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