发明名称 |
Topcoat material and use thereof in immersion lithography processes |
摘要 |
Disclosed is a topcoat composition comprising a polymer having a dissolution rate of at least 1500 Å/second in an aqueous alkaline developer, and at least one solvent. The topcoat composition can be used to coat a photoresist layer on a material layer on a substrate, for example, a semiconductor chip. Also disclosed is a method of forming a pattern in the material layer of the coated substrate.
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申请公布号 |
US7521172(B2) |
申请公布日期 |
2009.04.21 |
申请号 |
US20060380782 |
申请日期 |
2006.04.28 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
DAVID ROBERT ALLEN;BROCK PHILLIP JOE;BURNS SEAN DAVID;GOLDFARB DARIO LEONARDO;MEDEIROS DAVID;PFEIFFER DIRK;PINNOW MATT;SOORIYAKUMARAN RATNAM;SUNDBERG LINDA KARIN |
分类号 |
G03F7/20;C08F220/22;G03F7/26 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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