发明名称 |
Inspection method and inspection system using charged particle beam |
摘要 |
An electron beam system using a scanning electron microscope equipped with a function for controlling a charged state of a sample to be observed includes electron optics for obtaining image data of the scanning electron microscope, and a monitor that displays a relationship between an equation for determining a degree of separation of peaks which appear in a histogram obtained on a basis of the image data and at least one parameter among parameters for controlling the charged state of the sample. An optimized parameter for controlling the charged stage of the sample can be visually distinguished on the monitor.
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申请公布号 |
US7521679(B2) |
申请公布日期 |
2009.04.21 |
申请号 |
US20070706330 |
申请日期 |
2007.02.15 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
NISHIYAMA HIDETOSHI;NOZOE MARI |
分类号 |
G01N23/225;G21K7/00;G01N23/00;H01J37/02;H01J37/22;H01J37/28;H01L21/66 |
主分类号 |
G01N23/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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