Semiconductor substrate surface protection method

摘要

A semiconductor substrate surface protection method for maintaining surfaces thereof clean includes providing a tank containing pure water and a chemical protection material which is a high molecular straight-chain organic compound; and immersing the semiconductor substrate in the tank to deposit the high molecular straight-chain organic compound on the semiconductor substrate for maintaining the surfaces thereof clean. This convenient method prevents deposition of contaminating substances directly onto the semiconductor substrate and enables maintaining of this contaminant-free surface at a low cost.