发明名称 METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT AND LIGHT SOURCE APPARATUS OF THE EXTREME ULTRAVIOLET LIGHT
摘要 <p>A method for generating extreme ultraviolet light and an extreme ultraviolet light source apparatus are provided to make a relatively low current flow in a discharging region by forming the high temperature plasma satisfying the extreme ultraviolet radiation condition. A pulse power is supplied between first and second electrodes(2a,2b) installed inside a chamber(1). A discharge channel is formed between two electrodes. A laser beam(L1) is emitted from a laser source(7). The laser beam is irradiated to the high temperature plasma raw material(8). The low temperature plasma gas is supplied to the discharge channel. The radiation of the extreme ultraviolet light is started by converting the low temperature plasma gas to the high temperature plasma through the discharge. The radiation of the extreme ultraviolet light is condensed by an extreme ultraviolet light condenser(4) and is emitted from an extreme ultraviolet light pickup unit(5).</p>
申请公布号 KR20090033787(A) 申请公布日期 2009.04.06
申请号 KR20080081261 申请日期 2008.08.20
申请人 TOKYO INSTITUTE OF TECHNOLOGY;USHIO INC. 发明人 HOSOKAI TOMONAO;HORIOKA KAZUHIKO;SEKI KYOHEI;YOKOYAMA TAKUMA
分类号 H05H1/24;G03F7/20;H01L21/027 主分类号 H05H1/24
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