| 发明名称 |
ALIGNMENT SYSTEM AND METHODS FOR LITHOGRAPHIC SYSTEMS |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alignment system for a lithography projecting device, with the accuracy of positioning and/or robust properties improved. <P>SOLUTION: An alignment system for a lithographic apparatus has a source of alignment radiation, a detection system that has a first detector channel and a second detector channel, and a position determining unit that communicates with the detection system. The position-determining unit processes information from the first and second detector channels in combination and determines the position of an alignment mark on a first object relative to a reference position on a second object, based on the combined information. <P>COPYRIGHT: (C)2009,JPO&INPIT |
| 申请公布号 |
JP2009069163(A) |
申请公布日期 |
2009.04.02 |
| 申请号 |
JP20080307147 |
申请日期 |
2008.12.02 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
VAN BILSEN FRANCISCUS BERNARDUS MARIA;BURGHOORN JACOBUS;VAN HAREN RICHARD JOHANNES FRANCISCUS;HINNEN PAUL CHRISTIAAN;VAN HORSSEN HERMANUS GERARDUS;HUIJBREGTSE JEROEN;JUENINK ANDRE BERNARDUS;MEGENS HENRY;NAVARRO Y KOREN RAMON;TOLSMA HOITE PIETER THEODOOR;HUBERTUS JOHANNES GERTRUDUS SIMONS;SCHUURHUIS JOHNY RUTGER;SCHETS SICCO IAN;LEE BRIAN;DUNBAR ALLAN |
| 分类号 |
G01B11/00;G01B11/02;G01B21/00;G02B5/18;G03F7/00;G03F7/20;G03F9/00;G03F9/02;H01L21/027;H01L21/3205;H01L21/68;H01L23/52;H01S3/00 |
主分类号 |
G01B11/00 |
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